The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 12, 2014
Filed:
Dec. 02, 2011
Sang Hyun Yun, Suwon-si, KR;
Cha-dong Kim, Hwaseong-si, KR;
Jung-in Park, Seoul, KR;
HI Kuk Lee, Yongin-si, KR;
Su-yeon Sim, Changwon-si, KR;
Sang Hyun Yun, Suwon-si, KR;
Cha-Dong Kim, Hwaseong-si, KR;
Jung-In Park, Seoul, KR;
Hi Kuk Lee, Yongin-si, KR;
Su-Yeon Sim, Changwon-si, KR;
Samsung Display Co., Ltd., Yongin, KR;
Abstract
A method for manufacturing a photosensitive film pattern includes: forming a thin film on a substrate; forming a photosensitive film on the thin film; arranging an exposure apparatus including a photo-modulation element on the photosensitive film; exposing the photosensitive film using the exposure apparatus according to an exposure pattern of the photo-modulation element; and developing the exposed photosensitive film to form a photosensitive film pattern. The exposure pattern includes a main pattern of a quadrangular shape and a at least one assistance pattern positioned at a corner of the main pattern. The photosensitive film pattern has a quadrangular shape with a long edge and a short edge, and a corner with a curved surface having a curvature radius of 20% to 40% of a length of the short edge.