The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 12, 2014

Filed:

Mar. 31, 2010
Applicants:

Masahiro Yoshidome, Shizuoka, JP;

Shuji Hirano, Shizuoka, JP;

Hiroshi Saegusa, Shizuoka, JP;

Kaoru Iwato, Shizuoka, JP;

Yusuke Iizuka, Shizuoka, JP;

Inventors:

Masahiro Yoshidome, Shizuoka, JP;

Shuji Hirano, Shizuoka, JP;

Hiroshi Saegusa, Shizuoka, JP;

Kaoru Iwato, Shizuoka, JP;

Yusuke Iizuka, Shizuoka, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/004 (2006.01); G03F 7/38 (2006.01); G03F 7/039 (2006.01);
U.S. Cl.
CPC ...
G03F 7/0397 (2013.01); G03F 7/38 (2013.01); Y10S 430/108 (2013.01); Y10S 430/111 (2013.01);
Abstract

Provided is an actinic ray-sensitive or radiation-sensitive resin composition including: (A) a resin capable of increasing the solubility in an alkali developer by the action of an acid, the resin containing (a) a repeating unit represented by the following formula (AN-01), (B) a compound capable of generating an acid upon irradiation with an actinic ray or radiation, and (C) a resin that contains at least either a fluorine atom or a silicon atom and contains a repeating unit having a group capable of decomposing by the action of an alkali developer to increase the solubility in an alkali developer: wherein the variables in formula (AN-01) are defined in the description.


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