The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 12, 2014
Filed:
Jun. 24, 2011
Applicants:
Hana Ishii, Tsukuba, JP;
Julien Gatineau, Ibaraki, JP;
Inventors:
Hana Ishii, Tsukuba, JP;
Julien Gatineau, Ibaraki, JP;
Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C 16/00 (2006.01); C23C 16/30 (2006.01); C23C 16/455 (2006.01); C23C 14/06 (2006.01);
U.S. Cl.
CPC ...
C23C 16/305 (2013.01); C23C 16/45531 (2013.01); C23C 14/0623 (2013.01); C23C 16/45525 (2013.01);
Abstract
Methods and compositions for depositing a tellurium-containing film on a substrate are disclosed. A reactor and at least one substrate disposed in the reactor are provided. A tellurium-containing precursor is provided and introduced into the reactor, which is maintained at a temperature ranging from approximately 20° C. to approximately 100° C. Tellurium is deposited on to the substrate through a deposition process to form a thin film on the substrate.