The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 12, 2014
Filed:
Aug. 16, 2011
Yoshiharu Inoue, Kudamatsu, JP;
Michikazu Morimoto, Kudamatsu, JP;
Tsuyoshi Matsumoto, Kudamatsu, JP;
Tetsuo Ono, Kudamatsu, JP;
Tadamitsu Kanekiyo, Kudamatsu, JP;
Mamoru Yakushiji, Shunan, JP;
Masakazu Miyaji, Kudamatsu, JP;
Yoshiharu Inoue, Kudamatsu, JP;
Michikazu Morimoto, Kudamatsu, JP;
Tsuyoshi Matsumoto, Kudamatsu, JP;
Tetsuo Ono, Kudamatsu, JP;
Tadamitsu Kanekiyo, Kudamatsu, JP;
Mamoru Yakushiji, Shunan, JP;
Masakazu Miyaji, Kudamatsu, JP;
Hitachi High-Technologies Corporation, Tokyo, JP;
Abstract
In a plasma processing method for conducting etching on an object to be processed by generating plasma from depositional gas introduced into a processing chamber and exposing the object to be processed to the plasma in a state in which radio frequency power is applied, the object to be processed is etched under etching conditions that a deposit film on an inner wall of the processing chamber becomes amorphous by repeating a first period during which the object to be processed is exposed to plasma and a second period during which the object to be processed is exposed to plasma and an etching rate is lower as compared with the first period. Consequently, particles due to increase in the number of processed sheets of the object to be processed can be suppressed.