The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 05, 2014

Filed:

Nov. 21, 2011
Applicants:

Hiroyuki Soda, Funabashi, JP;

Takahiro Sakaguchi, Funabashi, JP;

Takahiro Kishioka, Toyama, JP;

Inventors:

Hiroyuki Soda, Funabashi, JP;

Takahiro Sakaguchi, Funabashi, JP;

Takahiro Kishioka, Toyama, JP;

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C08G 61/12 (2006.01); C08F 2/46 (2006.01); C08G 61/04 (2006.01); G03F 7/023 (2006.01); G02B 1/04 (2006.01); G03F 7/40 (2006.01);
U.S. Cl.
CPC ...
G02B 1/041 (2013.01); G03T 7/0005 (2013.01); G03F 7/0233 (2013.01); G03F 7/40 (2013.01);
Abstract

There is provided a photosensitive resin composition for microlenses. A photosensitive resin composition for microlenses including a component (A), a component (B) and a solvent. The component (A): a copolymer having a maleimide structural unit of Formula (1) and a repeating structural unit of Formula (2). The component (B): a photosensitizer (in Formula (2), Ris a hydrogen atom or a methyl group; Ris a single bond or a Calkylene group; Ris a thermally cross-linkable monovalent organic group; and in the repeating structural unit of Formula (2), Rs are optionally different from each other).


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