The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 05, 2014
Filed:
Mar. 30, 2010
Daniele Merlini, Agrate Brianza, IT;
Domenico Giusti, Monza, IT;
Fabrizio Fausto Renzo Toia, Busto Arsizio, IT;
Federica Ronchi, Bellusco, IT;
Daniele Merlini, Agrate Brianza, IT;
Domenico Giusti, Monza, IT;
Fabrizio Fausto Renzo Toia, Busto Arsizio, IT;
Federica Ronchi, Bellusco, IT;
STMicroelectronics S.R.L., Agrate Brianza (MB), IT;
Abstract
A method is for the formation of at least one filled isolation trench having a protective cap in a semiconductor layer, and a semiconductor device with at least one filled isolation trench having a protective cap. The method allows obtaining, in an easy way, filled isolation trenches exhibiting excellent functional and morphological properties. The method therefore allows the obtainment of effective filled isolation trenches which help provide elevated, reliable and stable isolation properties.