The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 05, 2014
Filed:
Jul. 13, 2012
Applicants:
Koji Hasegawa, Joetsu, JP;
Masayoshi Sagehashi, Joetsu, JP;
Yuuki Suka, Joetsu, JP;
Masashi Ilo, Joetsu, JP;
Inventors:
Koji Hasegawa, Joetsu, JP;
Masayoshi Sagehashi, Joetsu, JP;
Yuuki Suka, Joetsu, JP;
Masashi Ilo, Joetsu, JP;
Assignee:
Shin-Etsu Chemical Co., Ltd., Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/039 (2006.01); G03F 7/20 (2006.01); G03F 7/30 (2006.01); G03F 7/38 (2006.01); C08F 24/00 (2006.01);
U.S. Cl.
CPC ...
Abstract
Polymerizable ester compounds having formula (1) are novel wherein Ris H, F, methyl or trifluoromethyl, Ris an acid labile group, Aa is a divalent hydrocarbon group which may be separated by —O— or —C(═O)—, and kis 0 or 1. They are useful as monomers to produce polymers which are transparent to radiation ≦500 nm. Radiation-sensitive resist compositions comprising the polymers as base resin exhibit excellent developed properties.