The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 05, 2014
Filed:
Dec. 11, 2009
Applicants:
Hiroshi Saegusa, Shizuoka, JP;
Kaoru Iwato, Shizuoka, JP;
Shuji Hirano, Shizuoka, JP;
Yusuke Iizuka, Shizuoka, JP;
Inventors:
Hiroshi Saegusa, Shizuoka, JP;
Kaoru Iwato, Shizuoka, JP;
Shuji Hirano, Shizuoka, JP;
Yusuke Iizuka, Shizuoka, JP;
Assignee:
FUJIFILM Corporation, Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/004 (2006.01); G03F 7/028 (2006.01); G03F 7/039 (2006.01); G03F 7/26 (2006.01);
U.S. Cl.
CPC ...
Abstract
Provided is an actinic ray-sensitive or radiation-sensitive resin composition including: (A) a resin capable of increasing the solubility in an alkali developer by the action of an acid, (B) a compound capable of generating an acid upon irradiation with an actinic ray or radiation, and (C) a resin which contains (c) a repeating unit having at least one polarity conversion group and has at least either a fluorine atom or a silicon atom.