The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 05, 2014
Filed:
Dec. 08, 2011
Yong-jhin Cho, Suwon-si, KR;
Kun-tack Lee, Suwon-si, KR;
Hyo-san Lee, Suwon-si, KR;
Young-hoo Kim, Hwaseong-si, KR;
Jung-won Lee, Gunpo-si, KR;
Sang-won Bae, Incheon, KR;
Jung-min OH, Incheon, KR;
Yong-Jhin Cho, Suwon-si, KR;
Kun-Tack Lee, Suwon-si, KR;
Hyo-San Lee, Suwon-si, KR;
Young-Hoo Kim, Hwaseong-si, KR;
Jung-Won Lee, Gunpo-si, KR;
Sang-Won Bae, Incheon, KR;
Jung-Min Oh, Incheon, KR;
Samsung Electronics Co., Ltd., Suwon-Si, Gyeonggi-Do, KR;
Abstract
In a supercritical fluid method a supercritical fluid is supplied into a process chamber. The supercritical fluid is discharged from the process chamber as a supercritical fluid process proceeds. A concentration of a target material included in the supercritical fluid discharged from the process chamber is detected during the supercritical fluid process. An end point of the supercritical fluid process may be determined based on a detected concentration of the target material.