The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 05, 2014
Filed:
May. 12, 2010
Applicants:
John M. Cotte, New Fairfield, CT (US);
Harold J. Hovel, Katonah, NY (US);
Devendra K. Sadana, Pleasantville, NY (US);
Xiaoyan Shao, Yorktown Heights, NY (US);
Steven Erik Steen, Peekskill, NH (US);
Inventors:
John M. Cotte, New Fairfield, CT (US);
Harold J. Hovel, Katonah, NY (US);
Devendra K. Sadana, Pleasantville, NY (US);
Xiaoyan Shao, Yorktown Heights, NY (US);
Steven Erik Steen, Peekskill, NH (US);
Assignee:
International Business Machines Corporation, Armonk, NY (US);
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C25D 5/00 (2006.01); C25D 5/02 (2006.01); C25D 7/12 (2006.01); C25D 17/00 (2006.01);
U.S. Cl.
CPC ...
Abstract
A method of forming patterned metallization by electrodeposition under illumination without external voltage supply on a photovoltaic structure or on n-type region of a transistor/junction.