The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 29, 2014
Filed:
Feb. 13, 2006
Daxing Ren, Pleasanton, CA (US);
Enrico Magni, Pleasanton, CA (US);
Eric Lenz, Pleasanton, CA (US);
Ren Zhou, Fremont, CA (US);
Daxing Ren, Pleasanton, CA (US);
Enrico Magni, Pleasanton, CA (US);
Eric Lenz, Pleasanton, CA (US);
Ren Zhou, Fremont, CA (US);
Lam Research Corporation, Fremont, CA (US);
Abstract
An electrode assembly for a plasma reaction chamber used in semiconductor substrate processing having a backing member having a bonding surface, an inner electrode having a lower surface on one side and a bonding surface on the other side, and an outer electrode having a lower surface on one side and a bonding surface on the other side. At least one of the electrodes has a flange, which extends underneath at least a portion of the lower surface of the other electrode.