The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 22, 2014
Filed:
Apr. 15, 2010
Christophe DE Metsenaere, Eindhoven, NL;
Ronald Casper Kunst, Geldrop, NL;
Paul Petrus Joannes Berkvens, Veldhoven, NL;
Mauritius Gerardus Elisabeth Schneiders, Eindhoven, NL;
Jimmy Matheus Wilhelmus Van DE Winkel, Kessel, NL;
Gregory Martin Mason Corcoran, Eindhoven, NL;
Christophe De Metsenaere, Eindhoven, NL;
Ronald Casper Kunst, Geldrop, NL;
Paul Petrus Joannes Berkvens, Veldhoven, NL;
Mauritius Gerardus Elisabeth Schneiders, Eindhoven, NL;
Jimmy Matheus Wilhelmus Van De Winkel, Kessel, NL;
Gregory Martin Mason Corcoran, Eindhoven, NL;
ASML Netherlands B.V., Veldhoven, NL;
Abstract
An immersion lithographic apparatus has a pressure sensor configured to measure the pressure of immersion liquid in a space between the substrate and a projection system. A control system is responsive to a pressure signal generated by the pressure sensor and controls a positioner to exert a force on the substrate table to compensate for the force exerted on the substrate table by the immersion liquid.