The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 22, 2014
Filed:
May. 11, 2009
Applicant:
Yuho Kanaya, Kumagaya, JP;
Inventor:
Yuho Kanaya, Kumagaya, JP;
Assignee:
Nikon Corporation, Tokyo, JP;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G03B 27/58 (2006.01); G03B 27/52 (2006.01); G03B 27/42 (2006.01); G03B 27/32 (2006.01); G03F 7/20 (2006.01); G03B 27/54 (2006.01);
U.S. Cl.
CPC ...
G03F 7/70341 (2013.01); G03F 7/70775 (2013.01);
Abstract
In an exposure apparatus of a liquid immersion exposure method, a liquid immersion area is formed on the upper surface of a wafer by liquid supplied in a space formed with a projection optical system, and on a moving table holding the wafer, a plurality of encoder heads is placed. Of the plurality of encoder heads, a controller measures positional information of the moving table within an XY plane using an encoder head which is outside a liquid immersion area. This allows a highly precise and stable measurement of positional information of the moving table.