The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 22, 2014

Filed:

Jan. 11, 2013
Applicant:

Macronix International Co., Ltd., Hsin-Chu, TW;

Inventors:

Wing-Chor Chan, Hsinchu, TW;

Li-Fan Chen, Hsinchu, TW;

Chen-Yuan Lin, Taitung, TW;

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 29/66 (2006.01); H01L 27/07 (2006.01);
U.S. Cl.
CPC ...
H01L 27/0705 (2013.01);
Abstract

A semiconductor device comprising a high-voltage (HV) n-type metal oxide semiconductor (NMOS) embedded HV junction gate field-effect transistor (JFET) is provided. An HV NMOS with embedded HV JFET may include, according to a first example embodiment, a substrate, an N-type well region disposed adjacent to the substrate, a P-type well region disposed adjacent to the N-type well region, and first and second N+ doped regions disposed adjacent to the N-type well and on opposing sides of the P-type well region. The P-type well region may comprise a P+ doped region, a third N+ doped region and a gate structure, the third N+ doped region being interposed between the P+ doped region and the gate structure.


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Chan, Wing-Chor. (2014). N-channel metal-oxide field effect transistor with embedded high voltage junction gate field-effect transistor (U.S. Patent No. 8785988). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/8785988

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