The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 22, 2014
Filed:
Jul. 29, 2011
Masahiro Hashimoto, Shinjuku-ku, JP;
Kazunori Ono, Shinjuku-ku, JP;
Kenta Tsukagoshi, Shinjuku-ku, JP;
Tooru Fukui, Shinjuku-ku, JP;
Masahiro Hashimoto, Shinjuku-ku, JP;
Kazunori Ono, Shinjuku-ku, JP;
Kenta Tsukagoshi, Shinjuku-ku, JP;
Tooru Fukui, Shinjuku-ku, JP;
Hoya Corporation, Tokyo, JP;
Abstract
To solve a problem of reduction in accumulated energy due to backward scattering, leading to degradation in CD linearity, which is caused when a generally used high-contrast resist is used in the manufacture of a reflective mask. A reflective mask blank for manufacturing a reflective mask includes a substrate, a multilayer reflective film which is formed on the substrate and adapted to reflect exposure light, and an absorber film which is formed on the multilayer reflective film and adapted to absorb the exposure light. A resist film for electron beam writing is formed on the absorber film and the contrast value γ of the resist film for electron beam writing is 30 or less.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile