The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 8781308 B1

PDF
Full Text
Expired
Date of Patent:
Jul. 15, 2014

Filed:

Sep. 22, 2011
Applicant:

Masahiko Harumoto, Kyoto, JP;

Inventor:

Masahiko Harumoto, Kyoto, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
F27B 5/06 (2006.01); F27B 5/14 (2006.01); F27D 9/00 (2006.01); F27D 11/02 (2006.01);
U.S. Cl.
CPC ...
Abstract

The back surface of a substrate having a front surface coated with a resist film is irradiated with flashes of light emitted from flash lamps. Heat conduction from the back surface of the substrate abruptly raised in temperature by the irradiation with flashes of light toward the front surface thereof occurs to heat the resist film formed on the front surface of the substrate, so that a post-applied bake process is performed. After the completion of the post-applied bake process, a cooling plate cools down the substrate. Regardless of the type of resist film formed on the front surface of the substrate, the substrate has a constant absorptance of flashes of light to allow the resist film to be heated to a constant treatment temperature, because the back surface of the substrate is irradiated with flashes of light.


Find Patent Forward Citations

Harumoto, Masahiko. (2014). Apparatus for and method of heat-treating film formed on surface of substrate (U.S. Patent No. 8781308). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/8781308

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