The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 15, 2014

Filed:

Jan. 29, 2013
Applicants:

Kabushiki Kaishan Toshiba, Tokyo, JP;

Tdk Corportation, Tokyo, JP;

Inventors:

Satoshi Shirotori, Yokohama, JP;

Katsuhiko Koui, Yokohama, JP;

Shinobou Sugimura, Yokohama, JP;

Norihito Fujita, Fuchu, JP;

Akihiki Takeo, Kokubunji, JP;

Min Li, Fremont, CA (US);

Ruhang Ding, Pleasanton, CA (US);

Assignees:

Kabushiki Kaisha Toshiba, Tokyo, JP;

TDK Corporation, Tokyo, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G11B 5/127 (2006.01);
U.S. Cl.
CPC ...
Abstract

According to one embodiment, a magnetic recording head manufacturing method includes forming a spin torque oscillator layer on a main magnetic pole layer, forming a mask on the spin torque oscillator layer, processing the spin torque oscillator layer by performing ion beam etching through the mask, and partially modifying the main magnetic pole layer through the mask. The partially modifying the main magnetic pole layer makes it possible to decrease the saturation flux density of the main magnetic pole layer in the modified portion, and form an unmodified main magnetic pole portion covered with the mask, and a modified portion around the main magnetic pole.


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