The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 15, 2014

Filed:

Apr. 21, 2011
Applicants:

Naoyuki Kobayashi, Fukaya, JP;

Akikazu Tanimoto, Yokohama, JP;

Yasushi Mizuno, Saitama, JP;

Kenichi Shiraishi, Saitama, JP;

Katsushi Nakano, Kumagaya, JP;

Soichi Owa, Kumagaya, JP;

Inventors:

Naoyuki Kobayashi, Fukaya, JP;

Akikazu Tanimoto, Yokohama, JP;

Yasushi Mizuno, Saitama, JP;

Kenichi Shiraishi, Saitama, JP;

Katsushi Nakano, Kumagaya, JP;

Soichi Owa, Kumagaya, JP;

Assignee:

Nikon Corporation, Tokyo, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03B 27/42 (2006.01); G03B 27/52 (2006.01); G03F 7/20 (2006.01);
U.S. Cl.
CPC ...
G03F 7/70341 (2013.01); G03F 7/70925 (2013.01);
Abstract

An exposure apparatus includes an optical element via which a patterned beam is projected onto a substrate through exposure liquid filled in a space between the optical element and the substrate. The apparatus also includes a member having a flow passage in which exposure liquid flows, the flow passage being in fluidic communication with the space. The apparatus also includes a cleaning system which cleans the member.


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