The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 15, 2014

Filed:

May. 25, 2011
Applicants:

Atsuo Isobe, Kanagawa, JP;

Yoshinori Ieda, Kanagawa, JP;

Kiyoshi Kato, Kanagawa, JP;

Yuto Yakubo, Kanagawa, JP;

Yuki Hata, Kanagawa, JP;

Inventors:

Atsuo Isobe, Kanagawa, JP;

Yoshinori Ieda, Kanagawa, JP;

Kiyoshi Kato, Kanagawa, JP;

Yuto Yakubo, Kanagawa, JP;

Yuki Hata, Kanagawa, JP;

Assignee:

Semiconductor Energy Laboratory Co., Ltd., Atsugi-shi, Kanagawa-ken, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 29/10 (2006.01); H01L 27/115 (2006.01); H01L 27/108 (2006.01);
U.S. Cl.
CPC ...
H01L 27/1156 (2013.01); H01L 27/10852 (2013.01);
Abstract

It is an object to provide a semiconductor device with a novel structure in which stored data can be held even when power is not supplied and there is no limitation on the number of writings. A semiconductor device includes a second transistor and a capacitor provided over a first transistor. A source electrode of the second transistor which is in contact with a gate electrode of the first transistor is formed using a material having etching selectivity with respect to the gate electrode. By forming the source electrode of the second transistor using a material having etching selectivity with respect to the gate electrode of the first transistor, a margin in layout can be reduced, so that the degree of integration of the semiconductor device can be increased.


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