The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 15, 2014

Filed:

Mar. 07, 2011
Applicants:

Seokho Kang, Sturbridge, MA (US);

Charlotte Cutler, Waltham, MA (US);

Inventors:

Seokho Kang, Sturbridge, MA (US);

Charlotte Cutler, Waltham, MA (US);

Assignee:

Rohm and Haas Electronic Materials, Marlborough, MA (US);

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G03F 7/26 (2006.01);
U.S. Cl.
CPC ...
Abstract

Provided are methods of forming photolithographic patterns using a negative tone development process. Also provided are coated substrates and electronic devices formed by the methods. The methods find particular applicability in the manufacture of electronic devices.


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