The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 08, 2014
Filed:
Aug. 18, 2009
Wu-song Huang, Hopewell Junction, NY (US);
Martin Glodde, Yorktown Heights, NY (US);
Dario L. Goldfarb, Yorktown Heights, NY (US);
Wai-kin LI, Hopewell Junction, NY (US);
Sen Liu, Hopewell Junction, NY (US);
Libor Vyklicky, Yorktown Heights, NY (US);
Wu-Song Huang, Hopewell Junction, NY (US);
Martin Glodde, Yorktown Heights, NY (US);
Dario L. Goldfarb, Yorktown Heights, NY (US);
Wai-Kin Li, Hopewell Junction, NY (US);
Sen Liu, Hopewell Junction, NY (US);
Libor Vyklicky, Yorktown Heights, NY (US);
International Business Machines Corporation, Armonk, NY (US);
Abstract
A curable liquid formulation comprising: (i) one or more near-infrared absorbing polymethine dyes; (ii) one or more crosslinkable polymers; and (iii) one or more casting solvents. The invention is also directed to solid near-infrared absorbing films composed of crosslinked forms of the curable liquid formulation. The invention is also directed to a microelectronic substrate containing a coating of the solid near-infrared absorbing film as well as a method for patterning a photoresist layer coated on a microelectronic substrate in the case where the near-infrared absorbing film is between the microelectronic substrate and a photoresist film.