The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 08, 2014
Filed:
Mar. 16, 2012
Takashi Furuhashi, Yokohama, JP;
Miyoko Shimada, Yokohama, JP;
Ichiro Mizushima, Yokohama, JP;
Shinichi Nakao, Yokohama, JP;
Takashi Furuhashi, Yokohama, JP;
Miyoko Shimada, Yokohama, JP;
Ichiro Mizushima, Yokohama, JP;
Shinichi Nakao, Yokohama, JP;
Kabushiki Kaisha Toshiba, Tokyo, JP;
Abstract
In accordance with an embodiment, a semiconductor device includes a substrate, a line-and-space structure, a first film and a second film. The line-and-space structure includes line patterns arranged on the substrate parallel to one another at a predetermined distance. The first film is formed on side surfaces and bottom surfaces of the line patterns by an insulating film material. The second film is formed on the line-and-space structure across a space between the line patterns by a material showing low wettability to the first film. Space between the line patterns includes an air gap in which at least a bottom surface of the first film is totally exposed.