The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 08, 2014
Filed:
Mar. 05, 2010
Tingji Tang, Rolla, MO (US);
Gu Xu, Rolla, MO (US);
Xing-fu Zhong, Rolla, MO (US);
Wenbin Hong, Rolla, MO (US);
Tony D. Flaim, St. James, MO (US);
Kimberly Yess, St. James, MO (US);
Ramachandran K. Trichur, Rolla, MO (US);
Tingji Tang, Rolla, MO (US);
Gu Xu, Rolla, MO (US);
Xing-Fu Zhong, Rolla, MO (US);
Wenbin Hong, Rolla, MO (US);
Tony D. Flaim, St. James, MO (US);
Kimberly Yess, St. James, MO (US);
Ramachandran K. Trichur, Rolla, MO (US);
Brewer Science Inc., Rolla, MO (US);
Abstract
New compositions and methods of using those compositions as protective layers during the production of semiconductor and MEMS devices are provided. The compositions comprise a cycloolefin copolymer dispersed or dissolved in a solvent system, and can be used to form layers that protect a substrate during acid etching and other processing and handling. The protective layer can be photosensitive or non-photosensitive, and can be used with or without a primer layer beneath the protective layer. Preferred primer layers comprise a basic polymer in a solvent system.