The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 08, 2014

Filed:

Feb. 20, 2008
Applicants:

Ulrich Kretzer, Chemnitz, DE;

Stefan Eichler, Dresden, DE;

Thomas Bünger, Lüneburg, DE;

Inventors:

Ulrich Kretzer, Chemnitz, DE;

Stefan Eichler, Dresden, DE;

Thomas Bünger, Lüneburg, DE;

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01B 1/02 (2006.01); H01B 1/08 (2006.01); H01B 1/06 (2006.01); C30B 9/00 (2006.01); C30B 11/00 (2006.01); C30B 17/00 (2006.01); C30B 21/02 (2006.01); C30B 28/06 (2006.01);
U.S. Cl.
CPC ...
Abstract

In a process for manufacturing doped semiconductor single crystal comprises solidifying in a crucible, the amount of dopant is added into the semiconductor melt after the beginning of the crystal growth onto the seed crystal, or after at least partial solidification of the semiconductor single crystal in a conical or tapered portion of the crucible. Dopant may be partially added in advance into the crucible, with the remainder added into the semiconductor melt as described. Type III-V semiconductor single crystals or wafers having a diameter of at least about 100 mm, can be prepared having an electrical conductivity of at least about 250 Siemens/cm, and/or an electric resistivity of at most about 4×10Ωcm, and/or a significantly improved ratio of hall mobility to charge carrier concentration.


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