The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 01, 2014

Filed:

Sep. 23, 2011
Applicants:

Chih-hong Hwang, New Taipei, TW;

Chun-lin Chang, Hsinchu County, TW;

Nai-han Cheng, Hsinchu, TW;

Chi-ming Yang, Hsinchu, TW;

Chin-hsiang Lin, Hsin-chu, TW;

Inventors:

Chih-Hong Hwang, New Taipei, TW;

Chun-Lin Chang, Hsinchu County, TW;

Nai-Han Cheng, Hsinchu, TW;

Chi-Ming Yang, Hsinchu, TW;

Chin-Hsiang Lin, Hsin-chu, TW;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01J 37/244 (2006.01);
U.S. Cl.
CPC ...
Abstract

A beam monitoring device, method, and system is disclosed. An exemplary beam monitoring device includes a one dimensional (1D) profiler. The 1D profiler includes a Faraday having an insulation material and a conductive material. The beam monitoring device further includes a two dimensional (2D) profiler. The 2D profiler includes a plurality of Faraday having an insulation material and a conductive material. The beam monitoring device further includes a control arm. The control arm is operable to facilitate movement of the beam monitoring device in a longitudinal direction and to facilitate rotation of the beam monitoring device about an axis.


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