The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 01, 2014
Filed:
Jun. 10, 2010
Dnyanesh Chandrakant Tamboli, Breinigsville, PA (US);
Madhukar Bhaskara Rao, Fogelsville, PA (US);
Gautam Banerjee, Chandler, AZ (US);
Keith Randolph Fabregas, Nazareth, PA (US);
Dnyanesh Chandrakant Tamboli, Breinigsville, PA (US);
Madhukar Bhaskara Rao, Fogelsville, PA (US);
Gautam Banerjee, Chandler, AZ (US);
Keith Randolph Fabregas, Nazareth, PA (US);
Air Products and Chemicals, Inc., Allentown, PA (US);
Abstract
The present invention is a method of cleaning to removal residue in semiconductor manufacturing processing, comprising contacting a surface to be cleaned with an aqueous formulation having a polymer selected from the group consisting of acrylamido-methyl-propane sulfonate) polymers, acrylic acid-2-acrylamido-2-methylpropane sulfonic acid copolymer and mixtures thereof and a quaternary ammonium hydroxide having greater than 4 carbon atoms or choline hydroxide with a non-acetylinic surfactant. The present invention is also a post-CMP cleaning formulation having the components set forth in the method above.