The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 24, 2014
Filed:
Jun. 07, 2006
Jeffrey Dysard, St. Charles, IL (US);
Sriram Anjur, Aurora, IL (US);
Timothy Johns, Naperville, IL (US);
Zhan Chen, Aurora, IL (US);
Jeffrey Dysard, St. Charles, IL (US);
Sriram Anjur, Aurora, IL (US);
Timothy Johns, Naperville, IL (US);
Zhan Chen, Aurora, IL (US);
Cabot Microelectronics Corporation, Aurora, IL (US);
Abstract
The present invention provides a method for polishing silicon nitride-containing substrates. The method comprises abrading a surface of a silicon nitride substrate with a polishing composition, which comprises colloidal silica, at least one acidic component, and an aqueous carrier. The at least one acidic component has a pKa in the range of about 1 to 4.5. The composition has a pH in the range of about 0.5 pH units less than the pKa of the at least one acidic component to about 1.5 pH units greater than the pKa.