The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 24, 2014
Filed:
Aug. 06, 2008
Applicants:
Keisuke Furuichi, Odawara, JP;
Nobuo Yoda, Tokyo, JP;
Inventors:
Keisuke Furuichi, Odawara, JP;
Nobuo Yoda, Tokyo, JP;
Assignee:
Meiji Co., Ltd., Tokyo, JP;
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
A23C 9/20 (2006.01); A23C 9/12 (2006.01); A23L 2/52 (2006.01); A23L 1/30 (2006.01);
U.S. Cl.
CPC ...
A23L 2/52 (2013.01); A23L 1/3014 (2013.01); A23C 9/20 (2013.01); A23C 9/12 (2013.01);
Abstract
A process for producing 1,4-dihydroxy-2-naphthoic acid, comprising initiating the culture of 1,4-dihydroxy-2-naphthoic acid producing bacteria belonging to propionic acid bacteria under anaerobic conditions and culturing the bacteria under aeration into a medium when the concentration of a carbon source in the medium is% by mass or less.