The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 17, 2014
Filed:
Mar. 09, 2011
Christiaan Louis Valentin, 's-Gravenzande, NL;
Antonius Franciscus Johannes DE Groot, Someren, NL;
Robert-han Munnig Schmidt, Hapert, NL;
Johannes Petrus Martinus Bernardus Vermeulen, Helmond, NL;
Bartholomeus Catharina Thomas Van Bree, Meijel, NL;
Christiaan Louis Valentin, 's-Gravenzande, NL;
Antonius Franciscus Johannes De Groot, Someren, NL;
Robert-Han Munnig Schmidt, Hapert, NL;
Johannes Petrus Martinus Bernardus Vermeulen, Helmond, NL;
Bartholomeus Catharina Thomas Van Bree, Meijel, NL;
ASML Netherlands B.V., Veldhoven, NL;
Abstract
A lithographic apparatus includes an illumination system configured to condition a radiation beam; a support constructed to support a patterning device, the patterning device being capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam; a substrate table constructed to hold a substrate; and a projection system configured to project the patterned radiation beam onto a target portion of the substrate. An optical element of the projection system is adjustable. The lithographic apparatus includes a controller to control the adjustable optical element. The controller is arranged to drive the optical element so as to at least partly compensate for a magnification resulting from a bending of the patterning device.