The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 17, 2014
Filed:
Mar. 19, 2009
Applicants:
Isao Yonekura, Kuki, JP;
Hidemitsu Hakii, Kuki, JP;
Inventors:
Isao Yonekura, Kuki, JP;
Hidemitsu Hakii, Kuki, JP;
Assignee:
Toppan Printing Co., Ltd., Tokyo, JP;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G01B 15/00 (2006.01); G01N 23/00 (2006.01); G21K 7/00 (2006.01); G01B 15/04 (2006.01);
U.S. Cl.
CPC ...
G01B 15/04 (2013.01); G01N 23/00 (2013.01); G21K 7/00 (2013.01);
Abstract
A microstructure inspection method which inspects an angle of a sidewall of a sample microstructure pattern, the method including: taking SEM photographs of the sample microstructure pattern under plural SEM conditions; measuring a width of a white band at an edge portion of the sample microstructure pattern in the SEM photographs; and calculating the angle of the sidewall of the sample microstructure pattern on the basis of an amount of change in the width of the white band due to the change between the plural SEM conditions.