The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 03, 2014

Filed:

Feb. 28, 2012
Applicant:

Yuichi Tanaka, Koshi, JP;

Inventor:

Yuichi Tanaka, Koshi, JP;

Assignee:

Tokyo Electron Limited, Minato-Ku, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G06F 7/00 (2006.01); B65G 1/00 (2006.01); B65B 21/02 (2006.01); B65B 69/00 (2006.01); B65G 65/04 (2006.01); B65G 65/34 (2006.01);
U.S. Cl.
CPC ...
Abstract

A substrate processing system comprising a first detecting part configured to detect unprocessed wafers, and a second detecting part configured to detect processed wafers. The first detecting part is configured to detect whether the unprocessed wafers are respectively accommodated in respective accommodating portions of a container or not, and to detect accommodated conditions of the respective unprocessed wafers accommodated in the respective accommodating portions. The second detecting part is configured to collectively detect whether the processed wafers are respectively accommodated in the respective accommodating portions of the container.


Find Patent Forward Citations

Tanaka, Yuichi. (2014). Substrate processing system, substrate detecting apparatus, and substrate detecting method (U.S. Patent No. 8744615). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/8744615

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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