The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 03, 2014
Filed:
Dec. 06, 2010
Maolin Long, Cupertino, CA (US);
Ralph LU, Newark, CA (US);
Fred Egley, Sunnyvale, CA (US);
Thomas Anderson, Hayward, CA (US);
Seyed Jafar Jafarian-tehrani, Fremont, CA (US);
Michael Giarratano, Union City, CA (US);
Maolin Long, Cupertino, CA (US);
Ralph Lu, Newark, CA (US);
Fred Egley, Sunnyvale, CA (US);
Thomas Anderson, Hayward, CA (US);
Seyed Jafar Jafarian-Tehrani, Fremont, CA (US);
Michael Giarratano, Union City, CA (US);
Lam Research Corporation, Fremont, CA (US);
Abstract
A filter for filtering radio frequency (RF) power transmitted from an electrostatic chuck (ESC) in a plasma processing system. The plasma processing system may include a heating element disposed at the ESC. The plasma processing system may further include a power supply. The filter may include a core member and a cable wound around and wound along the core member to form a set of inductors. The cable may include a plurality of wires, including a first wire and a second wire, a portion of the first wire and a portion of the second wire being twisted together, a first end of the first wire and a first end of the second wire being connected to the heating element, each of a second end of the first wire and a second end of the second wire being connected to a capacitor and being connected to the power supply.