The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 03, 2014
Filed:
May. 29, 2013
Applicant:
Nuflare Technology, Inc., Numazu, JP;
Inventor:
Takayuki Ohnishi, Numazu, JP;
Assignee:
NuFlare Technology, Inc., Numazu-shi, JP;
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/027 (2006.01); G03F 7/20 (2006.01); H01J 37/317 (2006.01); G03F 1/40 (2012.01);
U.S. Cl.
CPC ...
H01L 21/027 (2013.01); G03F 7/20 (2013.01); H01J 37/3174 (2013.01); G03F 1/40 (2013.01);
Abstract
A mask drawing method includes: disposing a grounding body provided with a grounding pin at a plurality of different places on a mask substrate to measure resistance values; disposing the grounding body at a position where the resistance value is lowest, among the plural positions where the resistance values are measured; and irradiating an electron beam to the mask substrate to draw a desired pattern.