The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 03, 2014
Filed:
May. 10, 2012
Ralf Richter, Dresden, DE;
Robert Seidel, Dresden, DE;
Juergen Boemmels, Dresden, DE;
Thomas Foltyn, Zwickau, DE;
Ralf Richter, Dresden, DE;
Robert Seidel, Dresden, DE;
Juergen Boemmels, Dresden, DE;
Thomas Foltyn, Zwickau, DE;
GLOBALFOUNDRIES Inc., Grand Cayman, KY;
Abstract
Interlayer connections, i.e., vertical connections, may be formed on the basis of a hard mask material, which may be positioned below, within or above an interlayer dielectric material, wherein one lateral dimension is defined by a trench mask, thereby obtaining a desired interlayer connection in a common patterning process. Furthermore, the thickness of at least certain portions of the metal lines may be adjusted with a high degree of flexibility, thereby providing the possibility of significantly reducing the overall resistivity of metal lines in metal levels, in which device performance may significantly depend on resistivity rather than parasitic capacitance.