The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 03, 2014
Filed:
Nov. 26, 2008
Arnold Kholodenko, San Francisco, CA (US);
Cheng-yu (Sean) Lin, Sunnyvale, CA (US);
Leon Ginzburg, Santa Clara, CA (US);
Mark Mandelboym, Santa Clara, CA (US);
Gregory A. Tomasch, Kelseyville, CA (US);
Anwar Husain, Pleasanton, CA (US);
Arnold Kholodenko, San Francisco, CA (US);
Cheng-Yu (Sean) Lin, Sunnyvale, CA (US);
Leon Ginzburg, Santa Clara, CA (US);
Mark Mandelboym, Santa Clara, CA (US);
Gregory A. Tomasch, Kelseyville, CA (US);
Anwar Husain, Pleasanton, CA (US);
Lam Research Corporation, Fremont, CA (US);
Abstract
In an example embodiment, a linear wet system includes a carrier and a proximity head in a chamber. The proximity head includes three sections in a linear arrangement. The first section suctions liquid from the upper surface of a semiconductor wafer as the wafer is transported by the carrier under the proximity head. The second section is configured to cause a film (or meniscus) of cleaning foam which is a non-Newtonian fluid to flow onto the upper surface of the wafer. The third section is configured to cause a film of rinsing fluid to flow onto the upper surface of the wafer as the wafer is carried under the proximity head. The third section is defined partially around the second section and up to the first section, so that the third section and the first section create a confinement of the cleaning foam with respect to the chamber.