The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 27, 2014
Filed:
Mar. 08, 2010
Applicants:
Min Cao, San Ramon, CA (US);
Roland Ruehl, San Carlos, CA (US);
Inventors:
Min Cao, San Ramon, CA (US);
Roland Ruehl, San Carlos, CA (US);
Assignee:
Cadence Design Systems, Inc., San Jose, CA (US);
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G06F 9/455 (2006.01); G06F 17/50 (2006.01);
U.S. Cl.
CPC ...
Abstract
Disclosed are a method, apparatus, and computer program product for performing interactive layout editing to address double patterning approaches to implement lithography of electronic designs. A spatial query is performed around the shape(s) being created during editing with the distance of allowed spacing in a single mask. If a design error is encountered, corrective editing may occur to correct the error. Checking may occur to make sure that the error detection and corrective actions can be performed interactively.