The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 27, 2014
Filed:
Oct. 20, 2010
Maolin Long, Cupertino, CA (US);
Seyed Jafar Jafarian-tehrani, Fremont, CA (US);
Arthur Sato, San Jose, CA (US);
Neil Martin Paul Benjamin, Austin, TX (US);
Norman Williams, Carmel, CA (US);
Maolin Long, Cupertino, CA (US);
Seyed Jafar Jafarian-Tehrani, Fremont, CA (US);
Arthur Sato, San Jose, CA (US);
Neil Martin Paul Benjamin, Austin, TX (US);
Norman Williams, Carmel, CA (US);
Lam Research Corporation, Fremont, CA (US);
Abstract
A plasma processing system for generating plasma to process at least a wafer. The plasma processing system includes a coil for conducting a current for sustaining at least a portion of the plasma. The plasma processing system also includes a sensor coupled with the coil for measuring a magnitude of a supplied current to provide a magnitude measurement without measuring any phase angle of the supplied current. The supplied current is the current or a total current that is used for providing a plurality of currents (e.g., including the current). The plasma processing system also includes a controller coupled with the sensor for generating a command using the magnitude measurement and/or information derived using the magnitude measurement, without using information related to phase angle measurement, and for providing the command for controlling the magnitude of the supplied current and/or a magnitude of the total current.