The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 27, 2014
Filed:
Feb. 24, 2009
Shunpei Yamazaki, Tokyo, JP;
Takahiro Ibe, Kanagawa, JP;
Takuya Tsurume, Kanagawa, JP;
Koichiro Tanaka, Kanagawa, JP;
Satoshi Seo, Kanagawa, JP;
Shunpei Yamazaki, Tokyo, JP;
Takahiro Ibe, Kanagawa, JP;
Takuya Tsurume, Kanagawa, JP;
Koichiro Tanaka, Kanagawa, JP;
Satoshi Seo, Kanagawa, JP;
Abstract
A film-formation method whereby a minute pattern thin film can be formed on a deposition substrate, without provision of a mask between a material and the deposition substrate. Moreover, a light-emitting element is formed by such a film-formation method, and a high-definition light-emitting device can be manufactured. Through a film-formation substrate in which a reflective layer, a light-absorbing layer and a material layer are formed, the light-absorbing layer is irradiated with light, so that a material contained in the material layer is deposited on a deposition substrate which is disposed to face the film-formation substrate. Since the reflective layer is selectively formed, a film to be deposited on the deposition substrate can be selectively formed with a minute pattern reflecting the pattern of the reflective layer. A wet process can be employed for formation of the material layer.