The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 27, 2014
Filed:
Oct. 12, 2011
Graham M. Bates, Waterbury, VT (US);
Michael T. Brigham, Bolton, VT (US);
Joseph K. Comeau, Alburgh, VT (US);
Jason P. Ritter, Jericho, VT (US);
Eva A. Shah, Essex Junction, VT (US);
Matthew T. Tiersch, Essex Junction, VT (US);
Eric J. White, Charlotte, VT (US);
Graham M. Bates, Waterbury, VT (US);
Michael T. Brigham, Bolton, VT (US);
Joseph K. Comeau, Alburgh, VT (US);
Jason P. Ritter, Jericho, VT (US);
Eva A. Shah, Essex Junction, VT (US);
Matthew T. Tiersch, Essex Junction, VT (US);
Eric J. White, Charlotte, VT (US);
International Business Machines Corporation, Armonk, NY (US);
Abstract
A composition and a method for chemical mechanical polishing. The composition includes a surfactant anion an alkyl alcohol, a controlled amount of chloride ion source and a diluent. The composition further includes abrasive particles and an oxidizer. The method includes providing the composition on a surface to be polished and polishing the surface by contacting the surface with a polishing pad.