The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 20, 2014
Filed:
Sep. 15, 2009
Jeroen Peter Johannes Bruijstens, Eindhoven, NL;
Richard Joseph Bruls, Eindhoven, NL;
Hans Jansen, Eindhoven, NL;
Siebe Landheer, Eindhoven, NL;
Arnout Johannes Meester, Eindhoven, NL;
Bauke Jansen, Deurne, NL;
Ivo Adam Johannes Thomas, Son, NL;
Marcio Alexandre Cano Miranda, Eindhoven, NL;
Gheorghe Tanasa, Eindhoven, NL;
Jeroen Peter Johannes Bruijstens, Eindhoven, NL;
Richard Joseph Bruls, Eindhoven, NL;
Hans Jansen, Eindhoven, NL;
Siebe Landheer, Eindhoven, NL;
Arnout Johannes Meester, Eindhoven, NL;
Bauke Jansen, Deurne, NL;
Ivo Adam Johannes Thomas, Son, NL;
Marcio Alexandre Cano Miranda, Eindhoven, NL;
Gheorghe Tanasa, Eindhoven, NL;
ASML Netherlands B.V., Veldhoven, NL;
Abstract
A lithographic apparatus comprising a projection system, and a liquid confinement structure configured to at least partly confine immersion liquid to an immersion space defined by the projection system, the liquid confinement structure and a substrate and/or substrate table is disclosed wherein a humid gas space is defined between the projection system, the liquid confinement structure and immersion liquid in the immersion space, the humid gas space being configured to contain humid gas.