The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 20, 2014
Filed:
Oct. 31, 2011
Kai-lin Chuang, Tainan, TW;
Wen-liang Huang, Hsinchu, TW;
Chia-hung Lin, Tainan, TW;
Chun-chi Yu, Taipei, TW;
Kai-Lin Chuang, Tainan, TW;
Wen-Liang Huang, Hsinchu, TW;
Chia-Hung Lin, Tainan, TW;
Chun-Chi Yu, Taipei, TW;
United Microelectronics Corp., Hsinchu, TW;
Abstract
An alignment accuracy (AA) mark is described, including N (N≧3) pattern sets defined by N exposure steps respectively. The N exposure steps are performed also to a device area disposed on a wafer together with the AA mark. The i-th (i=1, 2 . . . N−1) pattern set surrounds the (i+1)-th pattern set. Each pattern set includes a 1set of x-directional linear patterns, a 2set of x-directional linear patterns arranged opposite to the 1set of x-directional linear patterns in the y-direction, a 1set of y-directional linear patterns, and a 2set of y-directional linear patterns arranged opposite to the 1set of y-directional linear patterns in the x-direction, wherein each set of x- or y-directional linear patterns include at least three separate parallel linear patterns.