The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 20, 2014

Filed:

Jul. 13, 2012
Applicants:

Kenji Fujito, Ibaraki, JP;

Yasuhiro Uchiyama, Ibaraki, JP;

Inventors:

Kenji Fujito, Ibaraki, JP;

Yasuhiro Uchiyama, Ibaraki, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C30B 7/00 (2006.01); C30B 9/00 (2006.01); B32B 1/00 (2006.01); B32B 3/00 (2006.01); B32B 17/10 (2006.01); B32B 19/00 (2006.01); B32B 9/00 (2006.01); C30B 25/18 (2006.01); C30B 29/40 (2006.01); H01L 21/02 (2006.01);
U.S. Cl.
CPC ...
C30B 25/18 (2013.01); C30B 29/403 (2013.01); C30B 29/406 (2013.01); H01L 21/0237 (2013.01); H01L 21/02389 (2013.01); H01L 21/0243 (2013.01); H01L 21/02433 (2013.01); H01L 21/0254 (2013.01); H01L 21/0262 (2013.01);
Abstract

Provided is a base substrate with which a Group-III nitride crystal having a large area and a large thickness can be grown while inhibiting crack generation. A single-crystal substrate for use in growing a Group-III nitride crystal thereon, which satisfies the following expression (1), wherein Z1 (μm) is an amount of warpage of physical shape in a growth surface of the single-crystal substrate and Z2 (μm) is an amount of warpage calculated from a radius of curvature of crystallographic-plane shape in a growth surface of the single-crystal substrate: −40<Z2/Z1<−1: Expression (1).


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