The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 13, 2014
Filed:
Feb. 25, 2011
Applicant:
Rolf Wartmann, Waake, DE;
Inventor:
Rolf Wartmann, Waake, DE;
Assignee:
Carl Zeiss Microscopy GmbH, Jena, DE;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G02B 21/02 (2006.01); G02B 9/14 (2006.01);
U.S. Cl.
CPC ...
Abstract
A high-aperture immersion objective, in particular for confocal applications in fluorescence microscopy and for TIRF applications, having three subsystems of lenses and/or lens groups. The design of the subsystems has made it possible for a relatively large object field of 0.25 mm to be present in the case of a high-resolution numerical aperture of 1.49. Furthermore, improved transparency is possible up to a wavelength of 340 nm.
Quick Actions:
Wartmann, Rolf. (2014). High-aperture immersion objective (U.S. Patent No. 8724227). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/8724227
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile