The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 13, 2014
Filed:
Jun. 10, 2013
Kla-tencor Corporation, Milpitas, CA (US);
Upendra Ummethala, Cupertino, CA (US);
Layton Hale, Castro Valley, CA (US);
Josh Clyne, Sunnyvale, CA (US);
Samir Nayfeh, Shrewsbury, MA (US);
Mark Williams, Beaufort, SC (US);
Joseph A. DiRegolo, Livermore, CA (US);
Andrew Wilson, Forest Hills, NY (US);
KLA-Tencor Corporation, Milpitas, CA (US);
Abstract
A stage metrology suitable for REBL includes an interferometer stage metrology system configured to measure the position and rotation of a short-stroke wafer scanning stage, wherein the interferometer metrology system includes two or more interferometers for each axis of measurement, wherein a first interferometer mirror is disposed on a first surface of the short-stroke wafer scanning stage and a second interferometer mirror is disposed on a second surface of the short-stroke wafer scanning stage, and a control system configured to determine a shape error for the first interferometer mirror using two or more interferometer measurements from the two or more interferometers associated with the first interferometer mirror and a shape error for the second interferometer mirror using two or more interferometer measurements from the two or more interferometers associated with the second interferometer mirror.