The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 13, 2014

Filed:

Mar. 21, 2011
Applicants:

Sanjeev Kaushal, San Jose, CA (US);

Kenji Sugishima, Tokyo, JP;

Sukesh Janubhai Patel, Cupetino, CA (US);

Robert Filman, Menlo Park, CA (US);

Wolfgang Polak, Sunnyvale, CA (US);

Orion Wolfe, Oakland, CA (US);

Jessie Burger, Montain View, CA (US);

Inventors:

Sanjeev Kaushal, San Jose, CA (US);

Kenji Sugishima, Tokyo, JP;

Sukesh Janubhai Patel, Cupetino, CA (US);

Robert Filman, Menlo Park, CA (US);

Wolfgang Polak, Sunnyvale, CA (US);

Orion Wolfe, Oakland, CA (US);

Jessie Burger, Montain View, CA (US);

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G06T 11/20 (2006.01);
U.S. Cl.
CPC ...
Abstract

The subject disclosure relates to automatically learning relationships among a plurality of manufacturing tool parameters as applied to arbitrary semiconductor manufacturing tools and a graphical user interface that is supported, at least in part, by an autonomous learning system. The graphical user interface can create one or more matrixes based on received data and can further generate additional matrices by transforming the one or more matrixes. A series of windows can be output, wherein the series of windows, provide performance analysis that comprises a matching between a focus chamber and a reference chamber. In an aspect, the focus chamber and the reference chamber can be different chambers. In another aspect, the focus chamber and the reference chamber can be the same chamber, which provides analysis of the deterioration in performance of the same chamber over time.


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