The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 13, 2014
Filed:
Jan. 19, 2011
Shojiro Yukawa, Funabashi, JP;
Shinya Arase, Funabashi, JP;
Toshiaki Takeyama, Funabashi, JP;
Yuki Endo, Funabashi, JP;
Takeo Moro, Tokyo, JP;
Shojiro Yukawa, Funabashi, JP;
Shinya Arase, Funabashi, JP;
Toshiaki Takeyama, Funabashi, JP;
Yuki Endo, Funabashi, JP;
Takeo Moro, Tokyo, JP;
Nissan Chemical Industries, Ltd., Tokyo, JP;
Abstract
There is provided a resist composition suitable for forming a microlens which is excellent in transparency, heat resistance, and sensitivity characteristics, excellent in solubility in a developer, and as the result thereof has high resolution. A positive resist composition comprising; a component (A): an alkali-soluble polymer; a component (B): a compound having an organic group to be photolyzed to generate an alkali-soluble group; a component (C): a crosslinkable compound of Formula (1): [where R, R, and, Rare independently a Calkylene group or oxyalkylene group which are optionally branched; and E, E, and Eare independently a group containing a structure of Formula (2) or Formula (3): (where Ris a hydrogen atom or a methyl group)]; and a component (D): a solvent.