The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 8721833 B1

PDF
Full Text
Expired
Date of Patent:
May. 13, 2014

Filed:

Feb. 05, 2012
Applicants:

Zhiying Chen, Austin, TX (US);

Jianping Zhao, Austin, TX (US);

Lee Chen, Cedar Creek, TX (US);

Merritt Funk, Austin, TX (US);

Radha Sundararajan, Dripping Springs, TX (US);

Inventors:

Zhiying Chen, Austin, TX (US);

Jianping Zhao, Austin, TX (US);

Lee Chen, Cedar Creek, TX (US);

Merritt Funk, Austin, TX (US);

Radha Sundararajan, Dripping Springs, TX (US);

Assignee:

Tokyo Electron Limited, Minato-Ku, Tokyo, JP;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 21/306 (2006.01);
U.S. Cl.
CPC ...
Abstract

A replaceable chamber element for use in a plasma processing system, such as a plasma etching system, is described. The replaceable chamber element includes a chamber component configured to be exposed to plasma in a plasma processing system, wherein the chamber component is fabricated of a ferroelectric material.


Find Patent Forward Citations

Chen, Zhiying. (2014). Variable capacitance chamber component incorporating ferroelectric materials and methods of manufacturing and using thereof (U.S. Patent No. 8721833). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/8721833

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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