The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 29, 2014
Filed:
May. 02, 2011
Ronald Van Der Ham, Maarheze, NL;
Martinus Hendrikus Antonius Leenders, Rhoon, NL;
Johannes Catharinus Hubertus Mulkens, Valkenswaard, NL;
Richard Moerman, Son, NL;
Michel Riepen, Veldhoven, NL;
Sergei Shulepov, Eindhoven, NA;
Koen Steffens, Veldhoven, NL;
Jan Willem Cromwijk, Best, NL;
Johanna Antoinette Maria Sondag-huethorst, Valkenswaard, NL;
Marco Baragona, Delft, NL;
Robertus Leonardus Maria IN 't Groen, Tilburg, NL;
Ralph Theodorus Hubertus Maessen, Herten, NL;
Jacob Marinus Jan Den Toonder, Eindhoven, NL;
Milica Kovacevic-milivojevic, Eindhoven, NL;
Ronald Van Der Ham, Maarheze, NL;
Martinus Hendrikus Antonius Leenders, Rhoon, NL;
Johannes Catharinus Hubertus Mulkens, Valkenswaard, NL;
Richard Moerman, Son, NL;
Michel Riepen, Veldhoven, NL;
Sergei Shulepov, Eindhoven, NA;
Koen Steffens, Veldhoven, NL;
Jan Willem Cromwijk, Best, NL;
Johanna Antoinette Maria Sondag-Huethorst, Valkenswaard, NL;
Marco Baragona, Delft, NL;
Robertus Leonardus Maria In 'T Groen, Tilburg, NL;
Ralph Theodorus Hubertus Maessen, Herten, NL;
Jacob Marinus Jan Den Toonder, Eindhoven, NL;
Milica Kovacevic-Milivojevic, Eindhoven, NL;
ASML Netherlands B.V., Veldhoven, NL;
Abstract
A fluid handling structure to confine immersion liquid in a space between a projection system and a facing surface of a substrate, of a table to support the substrate, or both, is disclosed. The fluid handling structure includes a transponder to dissolve at least some of the gas in a bubble in the immersion liquid or to control a bubble in the immersion liquid so that it avoids entering an optical path of a beam from the projection system.