The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 29, 2014

Filed:

Feb. 10, 2012
Applicants:

Shih-wei Chang, Natick, MA (US);

Valeriy V. Ginzburg, Midland, MI (US);

Erin B. Vogel, Midland, MI (US);

Daniel J. Murray, Midland, MI (US);

Peter Trefonas, Medway, MA (US);

Phillip D. Hustad, Manvel, TX (US);

Inventors:

Shih-Wei Chang, Natick, MA (US);

Valeriy V. Ginzburg, Midland, MI (US);

Erin B. Vogel, Midland, MI (US);

Daniel J. Murray, Midland, MI (US);

Peter Trefonas, Medway, MA (US);

Phillip D. Hustad, Manvel, TX (US);

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C08L 53/00 (2006.01); B05D 3/02 (2006.01);
U.S. Cl.
CPC ...
C08L 53/00 (2013.01); B05D 3/02 (2013.01); C08L 2205/025 (2013.01);
Abstract

A block copolymer composition containing a diblock copolymer blend including a first poly(methyl methacrylate)-b-poly((trimethylsilyl)methyl methacrylate) diblock copolymer; and, a second poly(methyl methacrylate)-b-poly((trimethylsilyl)methyl methacrylate) diblock copolymer. Also provided are substrates treated with the block copolymer composition.


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