The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 22, 2014

Filed:

Dec. 15, 2011
Applicants:

Alan Ritchie, Menlo Park, CA (US);

Donny Young, Cupertino, CA (US);

Keith A. Miller, Mountain View, CA (US);

Muhammad Rasheed, San Jose, CA (US);

Steve Sansoni, Livermore, CA (US);

Uday Pai, San Jose, CA (US);

Inventors:

Alan Ritchie, Menlo Park, CA (US);

Donny Young, Cupertino, CA (US);

Keith A. Miller, Mountain View, CA (US);

Muhammad Rasheed, San Jose, CA (US);

Steve Sansoni, Livermore, CA (US);

Uday Pai, San Jose, CA (US);

Assignee:

Applied Materials, Inc., Santa Clara, CA (US);

Attorneys:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C23C 14/56 (2006.01);
U.S. Cl.
CPC ...
Abstract

In some embodiments, substrate processing apparatus may include a chamber body; a lid disposed atop the chamber body; a target assembly coupled to the lid, the target assembly including a target of material to be deposited on a substrate; an annular dark space shield having an inner wall disposed about an outer edge of the target; a seal ring disposed adjacent to an outer edge of the dark space shield; and a support member coupled to the lid proximate an outer end of the support member and extending radially inward such that the support member supports the seal ring and the annular dark space shield, wherein the support member provides sufficient compression when coupled to the lid such that a seal is formed between the support member and the seal ring and the seal ring and the target assembly.


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